BANGALORE, June 25: Bangalore-based Hind High Vacuum Co. Pvt. Ltd. (HHV), the flagship company of the HHV Group, has recently developed, ‘for the first time in the country’, a cluster-type, multi-chamber Plasma-Enhanced Chemical Vapour Deposition (PECVD) system which can be used to coat different types of thin films on substrates.
HHV Vice President R Giridhara Gopalan, in a release here today, said that ‘this tool is highly versatile and provides maximum flexibility to the user by combining multiple processes without having the need to break the vacuum. Each chamber can be configured for a particular process like, PECVD, PVD, Etching etc thereby enabling researchers to carry out multiple experiments simultaneously.
This equipment can be used for R&D in MEMS/NEMS, Solid State Lighting, Renewable Energy, Nano Electronics, and Photonics. It can also be integrated to a glove box unit for OLED applications. In addition HHV also offers certain standard process recipes along with the equipment.’
HHV Managing Director Prasanth Sakhamuri said that ‘we have already supplied 3 such systems to leading R&D institutions in India. The demand in the country could rise significantly for these systems in the coming years. HHV would also be looking at export of these tools to international R&D Labs.’ (UNI)
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